Journal of Heredity Advance Access published online on October 21, 2009
Journal of Heredity, doi:10.1093/jhered/esp085
Quantitative genetics and Mendelian inheritance |
Dominant and Recessive Inheritance Patterns of Diapause in the Two-Spotted Spider Mite Tetranychus urticae
From the Department of Biology and Geosciences, Graduate School of Science, Osaka City University, Osaka 558-8585, Japan (Kawakami, Numata, and Goto); the JST Innovation Satellite Kochi, Kochi 782-8502, Japan (Ito); and the Laboratory of Applied Entomology, Faculty of Agriculture, Kochi University, Kochi 783-8502, Japan (Ito). Hideharu Numata is now at the Department of Zoology, Graduate School of Science, Kyoto University, Sakyo, Kyoto 606-8502, Japan
Address correspondence to Shin G. Goto at the address above, or e-mail: shingoto{at}sci.osaka-cu.ac.jp.
In this study, we investigated the diapause incidence in 3 geographic strains of the two-spotted spider mite Tetranychus urticae (Acari: Tetranychidae). Under diapause-inducing conditions of 12:12 light:dark at 15 °C, the diapause incidence was nearly 100% in a strain from northern Japan (Sapporo), whereas it was nearly 0% in 2 strains from southern Japan (Itoman and Takanabe). Reciprocal crosses clearly showed that the nondiapause phenotype is inherited in a completely dominant manner, and no maternal effect was detected. Backcrosses to the Itoman and Takanabe strains suggested that dominant nondiapause alleles control the nondiapause phenotype. To clarify the genetic basis of nondiapause in the northern population, we also established a nondiapausing variant ("selected nondiapause" abbreviated as snd) from the Sapporo strain. Crossing experiments revealed that a single recessive allele is responsible for the nondiapause phenotype. Thus, both dominant and recessive inheritance patterns of diapause were detected in the T. urticae populations studied here.
Key Words: artificial selection diapause genetic basis geographic variation Tetranychidae
Corresponding Editor: Rob DeSalle
Received March 29, 2009
Revised June 30, 2009
Accepted September 3, 2009